Photocurable light-sensitive composition

Details Photocurable light-sensitive composition Photocurable light-sensitive composition

1978-12-29

1981-08-18

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430197, 430281, 430286, 430288, 430907, 430908, 430910, 430913, 430927, 20415916, 20415917, 20415923, G03C 171, G03C 168

Patent

active

042847079

ABSTRACT:
A photocurable composition comprising a first copolymer having a recurring unit of general formula (I): ##STR1## wherein Ar represents a substituted or unsubstituted phenyl group, R.sub.1 represents a lower alkyl group, and m.sub.1 and m.sub.2 are positive numbers with m.sub.1 being greater than or equal to m.sub.2 ;
and a second copolymer having a recurring unit of general formula (II): ##STR2## wherein R.sub.2 represents a lower alkyl group, X represents a hydrogen atom or a methyl group, and R.sub.3 represents an isobutyl group, a t-butyl group or a --CH.sub.2 Ar group where Ar represents a substituted or unsubstituted phenyl group and when R.sub.3 is --CH.sub.2 Ar, R.sub.2 can also be t-butyl and isobutyl, and n.sub.1, n.sub.2 and n.sub.3 are positive numbers but n.sub.1 can be zero and (n.sub.1 +n.sub.2)
.sub.3 equals to about 0.5 to 20; and containing suitable amounts of a cross-linking agent and a photoactivator.

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Corcoron; C. et al., "Research Disclosure", #16767, 3/1978.

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