Photocurable diazo or azide composition with acrylic copolymer h

Details Photocurable diazo or azide composition with acrylic copolymer h Photocurable diazo or azide composition with acrylic copolymer h

1984-09-28

1986-09-30

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430152, 430176, 430197, 430145, G03C 154, G03C 171

Patent

active

046147012

ABSTRACT:
A photocurable resin composition comprising

REFERENCES:
patent: 3733200 (1973-05-01), Takaishi et al.
patent: 3841874 (1974-10-01), Nishino
patent: 4123276 (1978-10-01), Kita et al.
patent: 4186069 (1980-01-01), Muzyczko et al.
patent: 4219616 (1980-08-01), Pope et al.
patent: 4220700 (1980-09-01), McGuckin et al.
patent: 4391894 (1983-07-01), Shimazu et al.
Journal of Television Society, vol. 37, No. 7(1983), pp. 35-40.
Kosar, J., "Light-Sensitive Systems", J. Wiley & Sons, 1965, p. 278.

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