Photocurable compositions

Details Photocurable compositions Photocurable compositions

1991-12-30

1993-08-24

Beck, Shrive

Stock material or miscellaneous articles

Composite

Of fluorinated addition polymer from unsaturated monomers

427508, 427517, B05D 306

Patent

active

052387470

ABSTRACT:
Novel photocurable, adherent coating compositions and a method for preparing such compositions are described. A substrate can be coated with a first compound bearing a plurality of onium groups and a second compound bearing a plurality of nucleophilic groups. The resulting coating cures readily upon exposure to actinic radiation. These compositions can be used in preparation of photoresists, composite membranes, and modifying surfaces either for accepting adhesives or releasing oily soil.

REFERENCES:
patent: 3189457 (1965-06-01), Burness
patent: 3320141 (1967-05-01), Cisney et al.
patent: 3335100 (1967-08-01), Geyer
patent: 3462274 (1969-08-01), Maeder et al.
patent: 4058401 (1977-11-01), Crivello
patent: 4069054 (1978-01-01), Smith
patent: 4069055 (1978-01-01), Crivello
patent: 4069056 (1978-01-01), Crivello
patent: 4081276 (1978-03-01), Crivello
patent: 4102687 (1978-07-01), Crivello
patent: 4108747 (1978-08-01), Crivello
patent: 4109068 (1978-08-01), Graham
patent: 4118297 (1978-10-01), Broxterman et al.
patent: 4133684 (1979-01-01), Tarumi
patent: 4175963 (1979-11-01), Crivello
patent: 4229519 (1980-10-01), Sharp et al.
patent: 4250203 (1981-02-01), Schlesinger et al.
patent: 4338232 (1982-07-01), Harris et al.
patent: 4405426 (1983-09-01), Hosoi et al.
patent: 4423136 (1983-12-01), Crivello et al.
patent: 4431782 (1984-02-01), Harris et al.
patent: 4466931 (1984-08-01), Tamsy
patent: 4544466 (1985-10-01), Lindstrom et al.
patent: 4544621 (1985-10-01), Roth
patent: 4551418 (1985-11-01), Hult et al.
patent: 4564580 (1986-01-01), Ichimura et al.
patent: 4610952 (1986-09-01), Crivello
patent: 4632891 (1986-12-01), Banks et al.
patent: 4668601 (1987-05-01), Kistner
patent: 4704324 (1987-11-01), Davis et al.
patent: 4708925 (1987-11-01), Newman
patent: 4749639 (1988-06-01), Frommeld
patent: 4765905 (1988-08-01), Kitamura et al.
patent: 4797187 (1989-01-01), Davis et al.
patent: 4798877 (1989-01-01), Hoffman et al.
patent: 4839203 (1989-06-01), Davis et al.
patent: 4941972 (1990-07-01), Kau et al.
patent: 5073643 (1991-12-01), Crivello
K. Inomata et al., "Synthesis of Multifunctional Polymeric Photosensitizers Containing Pendant Benzopehnone Radical and Various Quaternary Salt Structures and the Photochemical Reaction Using These Polymers", J. Chem. Soc., Japan, 1989 (7) pp. 1129-1134.
M. Ko et al, "Photopolymerization of Vinyl Monomers With Quaternary Ammonium Salts", J. Poly. Sci: Polymer Chemistry Edition, vol. 12, pp. 2943-2951 (1974).
Lloyd D. Taylor et al, "The Phtochemical Rearrangement of Polymeric N-(1-Pyridinio) Amidates, A Novel, Aqueous Photresist System", J. Poly. Sci: Part C Polymer Letters, vol. 26, pp. 177-180 (1988).
G. D. Jones et al., "Water-Soluble Photocupable Elastomer", Journal of Applied Polymer Science, vol. 23, pp. 115-122 (1979).
M. A. Ratcliff, Jr. et al., "Solvolytic and Radical Processes in the Photolysis of Benzylammonium Salts, Journal of Organic Chemistry", vol. 36, No. 21, pp. 3112-3120 (1971).
A. Kunieda et al., "Free-Radical Polymerization By Sulfonium Salt", Polymer Letters Edition, vol. 12, pp. 395-397 (1974).
Abstract, J1-C3 Semi-permeable sepn, 1274F, 46029, Japanese Kokai J6 1249-502A, Publication No. JP 090661 (Jun. 11, 1986).
Minoru Kumakura et al., "Properties of Membranes Obtained By Radiation Cast-Polymerization of Hydroxyalkyl Methacrylate Monomers", J. Membrane Sci., 17 (1984) pp. 71-77.
D. L. Schmidt, "Polymerization of Aryl Cyclic Sulfonium Switterions", reprint from ACS Symposium Series, No. 59, Ring-Opening Polymerization (1977).
D. L. Schmidt et al., "Water-Based Coatings From Aryl Cyclic Sulfonium Zwitterion (ACSZ) Monomers", reprint from Jan. 1974 issue of the Journal of Paint Technology, vol. 46; No. 588, pp. 41-46.
J. F. King et al., "Nucleophilic Substitution Factors, 1. Coplanar vs. Orthogonal Bimolecular Substitution at a Benzylic Carbon. X-ray Structure of 2-Iso-butyl-1,3-dihydrobenzo[c]thiophenium Perchlorate", J. Am. Chem. Soc. 1985, 107, pp. 3224-3232.
Melvin J. Hatch et al., "Sulfonium Polymers Derived from Ar-Vinylbenzyl Chloride. I. Exploratory Study of the Preparation and Properties of the Monomers and Polymers", J. Applied Polymer Science, vol. 13, pp. 721-744 (1969).
Alan L. Maycock et al., "Photochemical Reactions of Phenacyl- and Benzylsulfonium Salts", J. Org. Chem., vol. 35, No. 8, 1970, pp. 2532-2538.
Franklin D. Saeva et al., "Mechanism of One Electron Electrochemical Reductive Cleavage Reactions of Sulfonium Salts", J. Am. Chem. Soc., (1984), 106, pp. 4121-4125.
J. V. Crivello, "Cationic Polymerization--Iodonium and Sulfonium Salt Photo-initiators", Advances in Polymer Science 62, (1984) pp. 1-48.
S. Peter Pappas et al., "Photoinitiated Cationic Polymerization by Photosensitization of Onium Salts", (1979) Soc. of Photographic Scientists and Engineers, pp. 140-143.
James V. Crivello et al., "Rencent Advances in Thermally and Photochemically Initiated Cationic Polymerization", Polymer Journal, vol. 17, No. 1, (1985) pp. 73-83.
J. V. Crivello, "Recent Progress in the Design of New Photoiniators for Cationic Polymerization", Cationic Polymerization and Related Processes ISBN 0.12.287470.6 (1984) pp. 289-305.
F. Volatron et al., "Theoretical Study of the Reactivity of Phosphonium and Sulfonium Ylides with Carbonyl Groups", J. Am. Chem. Soc. (1984) 106, pp. 6117-6119.
J. D. Coyle, "Photochemistry of Sulphonium Compounds", The Chemistry of the Sulfonium Group Edited by C. J. M. Stirling and S. Patai (1981) Chapter 5, pp. 107-122.
Takayuki Otsu et al., "Polymerization of Methyl Methacrylate with Dimethylbenzylanilinium Chloride", J. Polymer Sci., Part A-1, vol. 7 (1969) pp. 3329-3336.
S. Peter Pappas, "UV Curing by Radical, Cationic and Concurrent Radical Cationic Polymerization", Radiat. Phys. Chem., vol. 25, Nos. 4-6, (1985) pp. 633-641.
E. Reichmanis et al., "Polymer Materials for Microlithography", Ann. Rev. Mater. Sci. (1987), 17, pp. 235-271.
S. K. Chadda et al., "Novel Thin-Film Composite Membranes Containing Photoreactive Groups Part I: Choosing the Photoreactive Group", Synopsis, Dept. of Chemistry, Dept. of Chemical Engineering, McMaster Univ., Hamilton, Ontario, Canada, pp. 1-23, Table 1-7, two pages of figures.
Howard E. Zimmerman et al., "Mechanistic Organic Photochemistry, II. Solvolytic Photochemical Reactions", Organic and Biological Chemistry, vol. 85, Apr. 5, 1963, pp. 915-922.
Cheng-I Lin et al., "Charge-Transfer-Induced Photosolvolysis of Benzyl Alcohols" Communications to the Editor, J. Am. Chem. Soc., 98:21, Oct. 13, 1976 pp. 6711-6713.
Cheng-I Lin et al., "Wavelength Dependent Carbonium Ion Formation by Photo-solvolysis of Benzoates", Communications to the Editor, J. Am. Chem. Soc., 98:24, Nov. 24, 1976, pp. 7848-7850.
C. G. Roffey, "Photopolymerization of Surface Coatings", a Wiley Interscience Publication, pp. 287-296 and 301-304 (1982).
B. Arnold et al., Homolytic versus heterolytic cleavage for the photochemistry of 1-naphthylmethyl derivatives. Feb. 28, 1985, pp. 3140-3146.
B. Foster et al., Substituent effects on homolytic versus heterolytic cleavage of (1-naphthylmethyl) trimethylammonium chlorides. Oct. 10, 1986, pp. 1599-1607.
Farrington and Daniels, Physical chemistry, 1979, Ch. 11, pp. 343-345.
Maycock and Berchtold, Photochemical Reactions of Phenacyl-and Benzylsulfonium Salts, J. Org. Chem., vol. 35, No. 8, 1970, pp. 2532-2538.

Affiliated with

Also associated with

Rating

Photocurable compositions does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photocurable compositions, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photocurable compositions will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-827679