Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1988-10-04
1990-07-24
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430 7, 430 23, 430 27, 430 28, 430142, 430145, G03C 160, G03C 171
Patent
active
049435124
ABSTRACT:
A photocurable resin composition is described, which comprises a specific type of photosensitive polymer obtained by copolymerization of a monomer of the following general formula [I] ##STR1## in which R.sup.1 represents H, CH.sub.3 or C.sub.2 H.sub.5, X represents --O-- or --NH--, Y represents a linear or branched hydrocarbon group having from 1 to 4 carbon atoms, and .PHI. represents ##STR2## Z.sup..crclbar., in which Z.sup..crclbar. represents an anion, and R.sup.2, R.sup.3 and R.sup.4 are independently an alkyl group having from 1 to 4 carbon atoms, and a monomer of the following general formula [II] ##STR3## in which R.sup.5 represents H, CH.sub.3 or C.sub.2 H.sub.5, and n and x are independently an integer of from 1 to 4. The photosensitive polymer is photocrosslinked with a diazide compound. The resin composition is particularly suitably for use in formation of a color filter because of good dyeability and good adhesion to a substrate.
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Kawabata Hiroshi
Kobayashi Katsuhiko
Sato Hideo
Bowers Jr. Charles L.
Chisso Corporation
Philpitt Fred
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