Photocrosslinkable, high-temperature-resistant polymers and thei

Details Photocrosslinkable, high-temperature-resistant polymers and thei Photocrosslinkable, high-temperature-resistant polymers and thei

1980-09-10

1982-07-20

Phynes, Lucille M.

Chemistry: electrical and wave energy

Processes and products

Processes of treating materials by wave energy

20415919, 525438, 525445, 528176, 528190, 528192, 528194, 528293, 528295, 528297, 528298, 528302, 528303, 528304, C08F 800, C08G 1800, C08G 6300, C08G 6900

Patent

active

043404545

ABSTRACT:
Photocrosslinkable, organic-solvent-soluble polymers having a Tg greater than 200.degree. C., are disclosed. The polymer contains sufficient radiation-sensitive crosslinkable units to render the polymer insoluble in organic solvents on exposure to radiation to which the crosslinkable units of the polymer are sensitive.

REFERENCES:
patent: 2681857 (1954-06-01), Rogers
patent: 2750524 (1956-06-01), Braham
patent: 3030208 (1962-04-01), Schellenberg et al.
patent: 3554975 (1971-01-01), Keck
patent: 3622320 (1971-11-01), Allen
patent: 3627732 (1971-12-01), Ford et al.
patent: 3707373 (1972-12-01), Martinson et al.
patent: 3719728 (1973-03-01), Mirnada
patent: 3856751 (1974-12-01), Wilson
patent: 3884695 (1975-05-01), Gallaro et al.
patent: 3923523 (1975-12-01), Nishikubo et al.
patent: 3929489 (1975-12-01), Arcesi et al.
patent: 4048146 (1977-09-01), Wilson
patent: 4081277 (1978-03-01), Brault et al.
patent: 4158618 (1979-06-01), Pastor
patent: 4196010 (1980-04-01), Sandhu
Research Disclosure, vol. 135, Item 13568, Jul. 1975.

Affiliated with

Also associated with

Rating

Photocrosslinkable, high-temperature-resistant polymers and thei does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photocrosslinkable, high-temperature-resistant polymers and thei, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photocrosslinkable, high-temperature-resistant polymers and thei will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-249104