Radiation imagery chemistry: process – composition – or product th – Electric or magnetic imagery – e.g. – xerography,... – Process of making radiation-sensitive product
Patent
1997-11-18
2000-04-18
Dote, Janis L.
Radiation imagery chemistry: process, composition, or product th
Electric or magnetic imagery, e.g., xerography,...
Process of making radiation-sensitive product
430 65, 430 69, G03G 510
Patent
active
060513578
ABSTRACT:
An electrophotography photoconductor has a conductive substrate and an anodic oxidation layer on which a photoconductive layer is formed. The sealed surface of the anodic oxidation has an admittance ranging from 0.4 S/m.sup.2 to 30 S/m.sup.2 and a contact angle of pure water ranging 30.degree. to 80.degree.. The surface of the anodic oxidation layer is sealed by dipping it into a nickel acetate solution. The contact angle and the admittance are determined depending on a temperature of the nickel acetate solution and a sealing time. In the case where the sealed surface is irradiated with ultraviolet rays, the heat-resisting property and cleanliness are improved.
REFERENCES:
patent: 4800144 (1989-01-01), Ueda
patent: 5434027 (1995-07-01), Oshiba et al.
patent: 5783344 (1998-07-01), Kobayashi et al.
patent: 5908724 (1999-06-01), Matsui
Grant, R. et al. Ed, Grant & Hackh's Chemical Dictionary, Fifth Edition, McGraw-Hill Book Company, NY (1987), pp. 626-627.
Patent & Trademark Office English-Language Translation of JP 7-295266 (Pub Nov. 10, 1995).
Japanese Office Action, dated Jan. 19, 1999, with English Language Translation of Japanese Examiner's comments.
Kakihana Yasufumi
Matsui Naoyuki
Dote Janis L.
NEC Corporation
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