Photoconductor elements with multiphase stress-dampening interla

Details Photoconductor elements with multiphase stress-dampening interla Photoconductor elements with multiphase stress-dampening interla

1989-10-30

1991-07-16

Goodrow, John

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Radiation-sensitive composition or product

430 96, G03G 514

Patent

active

050324810

ABSTRACT:
An improved interlayer is provided for use in a photoconductor element between an electrically conductive layer and a charge generation layer of the type where a dye is aggregated in a matrix polymer. The interlayer is a mixture of at least one polyester and at least one polycarbonate. The interlayer provides excellent adhesion between the conductive layer and the charge generation layer and dampens any stress to which the photoconductive element is subjected. Minimal effect on photosensitivity is achieved by optimizing interlayer thickness.

REFERENCES:
patent: 4346158 (1982-08-01), Pai et al.

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