Photoconductive recording material with special outermost layer

Details Photoconductive recording material with special outermost layer Photoconductive recording material with special outermost layer

1990-11-09

1993-05-04

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Radiation-sensitive composition or product

430 66, 430 96, 430 58, G03G 514

Patent

active

052081281

ABSTRACT:
Photoconductive recording material which incorporates in an outermost layer a siloxane-copolymer including at least one polysiloxane block that is copolymerized with aromatic carbonate units, wherein the polysiloxane block(s) consist(s) of 5 to 200 chemically bonded diorgano siloxy units in which the organic substituents are selected from the group consisting of an alkyl, an aralkyl, an alkaryl and an aryl group, and said block(s) is (are) present in an amount by weight in the range of 0.3% to 6% with respect to the total weight of said copolymer.

REFERENCES:
patent: 4923775 (1990-05-01), Schank et al.
patent: 4962008 (1990-10-01), Kniura et al.
patent: 5032481 (1991-07-01), Berwick et al.

Affiliated with

Also associated with

Rating

Photoconductive recording material with special outermost layer does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photoconductive recording material with special outermost layer, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photoconductive recording material with special outermost layer will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1974538