Stock material or miscellaneous articles – Composite – Of addition polymer from unsaturated monomers
Patent
1988-12-06
1991-04-16
Cashion, Jr., Merrell C.
Stock material or miscellaneous articles
Composite
Of addition polymer from unsaturated monomers
428522, 428524, 428527, 350 16, 350164, 350582, 430 5, B32B 2708
Patent
active
050081560
ABSTRACT:
Mid and deep ultraviolet light transmitting pellicles for protecting photomasks from particle contamination during a projection printing process. The pellicles are manufactured from polyglycidyl-methacrylate-ethacrylate copolymer, from polyvinyl butyral polymer or from nitrocellulose. The polyvinyl butyral pellicle is sandwiched between two layers of an antireflective coating of poly-1H, 1H Pentadecafluorooctyl methacrylate or poly-1H, 1H Pentadecafluorooctyl acrylate. The nitrocellulose pellicle includes two double layers of antireflective material with the first double layer positioned on one side of the nitrocellulose layer and comprising a layer of the thermoplastic phenolic resin novalac and a layer of either poly-1H, 1H Pentadecafluorooctyl methacrylate or poly-1H, 1H Pentadecafluorooctyl acrylate. The second double layer is positioned on the other side of the nitrocellulose layer and comprises a layer of novolac and a layer of either poly-1H, 1H Pentadecafluorooctyl methacrylate or poly-1H, 1H Pentadecafluorooctyle acrylate.
REFERENCES:
patent: 4131363 (1978-12-01), Shea et al.
patent: 4378953 (1983-04-01), Winn
patent: 4476172 (1984-10-01), Ward
patent: 4482591 (1984-11-01), Ward
patent: 4499231 (1985-02-01), Ward et al.
patent: 4523974 (1985-01-01), Duly et al.
patent: 4536240 (1985-08-01), Winn
patent: 4657805 (1987-04-01), Fukumitsu et al.
Ron Hershel, Pellicle Protection of Integrated Circuit (IC) Masks, SPIE, vol. 275, Semiconductor Microlithography VI, 1981, 23-28.
R. Iscoff, Pellicle 1985, An update, Semiconductor International, Apr. 1985.
I. Ward and D. Duly, Optical Microlithograph III: Technology for the Next Decade, SPIE, vol. 470, pp. 147-154 (H. L. Stover, Editor), 1984.
F. W. Billmeyer, Jr., Textbook of Polymer Science, pp. 468-470 (John Wiley and Sons, Inc., 2nd ed., 1971).
Cashion Jr. Merrell C.
Exion Technology, Inc.
Nakarani D. S.
Schatzel Thomas E.
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