Photochemically stable deep ultraviolet pellicles for excimer la

Details Photochemically stable deep ultraviolet pellicles for excimer la Photochemically stable deep ultraviolet pellicles for excimer la

1992-08-27

1994-09-06

Thomas, Alexander S.

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428422, 359350, A47G 112, G03F 100, G03F 900

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active

053446771

ABSTRACT:
An embodiment of the present invention is a pellicle for use on a photomask reticle used in conjunction with deep ultraviolet light wavelengths. The membrane of the pellicle comprises a purified fluoropolymer that has been spin coated on a substrate of nitrocellulose and then separated and mounted on an aluminum frame. The aluminum frame has vents that filter air of contaminants and which allow an equalization of air pressure on both sides of the pellicle membrane when a peel-off backliner is in place on the opposite side of the frame. A permanent bond is made between the membrane and frame and a sticky adhesive is used to keep the backliner on the frame until peel-off. The sticky adhesive is such that the backliner may be re-attached a plurality of times.

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Ward & Duly, "A Broadband Deep UV Pellicle . . . , " SPIE vol. 470 Optical Microlithography III: Technology for the Next Decade (Dec. 1984), pp. 147-156.
Rothchild & Sedlacek, "Laser induced damage in pellicles at 193 nm," SPIE Dec. '92 Proceedings.

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