Photochemical vapor phase reaction apparatus and method of causi

Details Photochemical vapor phase reaction apparatus and method of causi Photochemical vapor phase reaction apparatus and method of causi

1991-03-22

1994-02-22

Hearn, Brian E.

Coating apparatus

Gas or vapor deposition

With treating means

118723E, 118719, 118723MP, 156345, H01L 2100

Patent

active

052886840

ABSTRACT:
A photochemical vapor phase reaction apparatus and a method of causing a photochemical vapor phase reaction are described. The apparatus comprises a vacuum chamber, a substrate holder provided in the vacuum chamber for holding a substrate to be treated by a vapor phase reaction, a gas feeding system for supplying a reactive gas to the reaction space, a light source housed in a light source room for emitting light rays through a light window, an optical system for condensing and projecting the light rays emitted from the light source onto the substrate on the holder. By this configuration, the intensity of light is relatively low at the light window and relatively high at the surface of a substrate to be treated.

REFERENCES:
patent: 4115163 (1978-09-01), Gorina et al.
patent: 4654226 (1987-03-01), Jackson et al.
patent: 4836140 (1989-06-01), Koji
patent: 4857382 (1989-08-01), Liu et al.
patent: 4974542 (1990-12-01), Hayashi et al.

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