Photochemical vapor deposition process for depositing oxide laye

Details Photochemical vapor deposition process for depositing oxide laye Photochemical vapor deposition process for depositing oxide laye

1985-07-22

1986-12-23

Newsome, John H.

Coating processes

Electrical product produced

Welding electrode

427 93, C23C 1650

Patent

active

046311998

ABSTRACT:
An improved process for depositing an oxide layer on a substrate by exposing the substrate to a selected vapor phase reactant and an oxygen-containing precursor comprising nitrous oxide mixed with molecular oxygen in a predetermined ratio, in the presence of radiation of a selected wavelength. The radiation causes the direct dissociation of the oxygen-containing precursor to form neutral oxygen atoms that react with the vapor phase reactant and form the oxide, which deposits as a layer on the substrate. The rate of reaction to form and deposit the oxide layer is enhanced by the mixing of molecular oxygen with nitrous oxide in the precursor.

REFERENCES:
patent: 4002512 (1977-01-01), Lim
patent: 4109030 (1978-08-01), Briska et al.
patent: 4371587 (1983-02-01), Peters
patent: 4495218 (1985-01-01), Azuma et al.

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