Coating processes – Electrical product produced – Welding electrode
Patent
1985-03-21
1986-04-08
Page, Thurman K.
Coating processes
Electrical product produced
Welding electrode
427 541, 427 55, B05D 306
Patent
active
045812497
ABSTRACT:
A photochemical vapor deposition method comprises introducing a starting gas into a reaction chamber, irradiating the starting gas with a light energy, and forming a deposition film on a substrate by utilizing a photochemical reaction, characterized in that the plural starting gases are introduced into the reaction chamber and the film is formed on said substrate by causing chemical reactions by irradiating molecules of these starting gases with individual light energy having a wavelength region corresponding to an absorption spectrum of each of said starting gas.
A photochemical vapor deposition method comprises introducing a starting gas into a reaction chamber, irradiating the starting gas with a light energy, and forming a deposition film on a substrate by utilizing a photochemical reaction, characterized in that the starting gas is introduced into the reaction chamber and the deposition film is formed on the substrate by causing a chemical reaction by irradiating with light energy having a wavelength region corresponding to an absorption spectrum of said starting gas and irradiating with light energy having gas and irradiating with light energy having a wavelength region corresponding to an absorption spectrum of chemical substance produced from said starting gas.
REFERENCES:
patent: 4009364 (1977-02-01), Ladstadter
patent: 4059461 (1977-11-01), Fan et al.
patent: 4104438 (1978-08-01), Angeld et al.
patent: 4181751 (1980-01-01), Hall et al.
patent: 4324854 (1982-04-01), Beauchamp et al.
patent: 4371587 (1983-02-01), Peters
patent: 4401689 (1983-08-01), Ban
patent: 4435445 (1984-03-01), Allred et al.
patent: 4447469 (1984-05-01), Peters
patent: 4490211 (1984-12-01), Chen et al.
patent: 4522845 (1985-06-01), Powell et al.
Canon Kabushiki Kaisha
Page Thurman K.
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