Photochemical vapor deposition apparatus

Details Photochemical vapor deposition apparatus Photochemical vapor deposition apparatus

1983-12-29

1985-06-25

Smith, John D.

Coating processes

Electrical product produced

Welding electrode

427 38, 118719, 118723, 118 501, C23C 1308, B05D 306

Patent

active

045253820

ABSTRACT:
In a photochemical vapor deposition apparatus comprising a reaction space, which forms a passage for a photoreactive gas and in which a substrate is to be placed, and a discharge space, in which electric plasma discharge is generated for radiating ultraviolet rays which cause photochemical reaction of the photoreactive gas, both the spaces being surrounded by the same vessel, discharging electrodes arranged opposite one another with said discharge space therebetween, and a grid comprising a wire-netting of metal interposed between the discharge space and the reaction space, to which grid is applied a voltage of positive potential.
This photochemical vapor deposition apparatus can achieve photochemical vapor deposition with high efficiency, because the diffusion of plasma into the reaction space is interrupted by the grid so that the substrate is permitted to be placed at a position closer to an ultraviolet ray source and ultraviolet rays of larger intensity are applied to the substrate. As a result, photochemical vapor deposition can be achieved with high efficiency.

REFERENCES:
patent: 4158589 (1979-06-01), Keller et al.
patent: 4454835 (1984-06-01), Walsh et al.

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