Photochemical vapor deposition apparatus

Details Photochemical vapor deposition apparatus Photochemical vapor deposition apparatus

1983-12-29

1985-06-25

Smith, John D.

Coating processes

Electrical product produced

Welding electrode

118719, 118723, 118 501, 427 38, B05D 306, C23C 1308

Patent

active

045253811

ABSTRACT:
In a photochemical vapor deposition apparatus, a reaction space in which a substrate is to be placed and a discharge space adjacent to the reaction space, in which electric plasma discharge is generated for radiating ultraviolet rays which cause photochemical decomposition reaction of a photoreactive gas, are surrounded by the same vessel, and discharging electrodes are provided in the discharge space so as to be opposite to each other in a first level and a second level, which are different in level in the direction in which the spaces align. The discharging electrode arranged in the first level, which is closer to the reaction space, has such a configuration or arrangement that an ultraviolet ray-passing opening is formed.
According to the apparatus, a vapor-deposited film can be formed with high efficiency, because a large quantity of ultraviolet rays can be applied to the substrate without any damage of the vapor-deposited film.

REFERENCES:
patent: 3310424 (1967-03-01), Wehner et al.
patent: 4158589 (1979-06-01), Keller et al.
patent: 4277304 (1981-07-01), Horiike et al.
patent: 4317844 (1982-03-01), Carlson
patent: 4415602 (1983-11-01), Brodie et al.
patent: 4454835 (1984-06-01), Walsh et al.
Maissel et al., "Handbook of Thin Film Tech", McGraw Hill Bk. Co., New York, 1970, pp. 4-6 to 4-8.

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