Photochemical process for substrate surface preparation

Details Photochemical process for substrate surface preparation Photochemical process for substrate surface preparation

1984-12-17

1986-05-20

Page, Thurman K.

Coating processes

Electrical product produced

Welding electrode

427 541, 427 82, 427 86, 427226, 4272481, 427255, 427307, B05D 306, B05D 512, C23C 1300

Patent

active

045900914

ABSTRACT:
A substrate having an undesired native oxide layer formed on the surface thereof is treated at a low temperature by exposure to a chosen vapor phase hydrogen-containing precursor in the presence of radiation of a selected wavelength. Upon radiation-inducement, neutral hydrogen species are formed from the precursor and interact with the native oxide to convert the native oxide to a chemically reduced form. By this process, thermal damage and charge damage to the substrate are avoided and the electrical properties of a subsequently formed device are enhanced.

REFERENCES:
patent: 4265932 (1981-05-01), Peters et al.
patent: 4341818 (1982-07-01), Adams et al.
patent: 4371587 (1983-02-01), Peters
patent: 4434189 (1984-02-01), Zaplatynsky
patent: 4435445 (1984-03-01), Allred et al.
patent: 4448801 (1984-05-01), Fukuda et al.
patent: 4474829 (1984-10-01), Peters
F. J. Ryan et al., "Reduction of HgCdTe Surfaces Using In-Situ Atomic Hydrogenation", Extended Abstract of the 1983 U.S. Workshop on Physics and Chemistry of HgCdTe, (Feb. 8-10, 1983).
D. J. Ehrlich, et al., "Laser-Induced Photochemical Reactions for Electronic Device Fabrication," Laser and Electron Beam Processing of Materials, Part XI; Device Applications, Academic Press, Inc. 1980, pp. 671-677.

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