Photochemical preparation of silanes containing imide groups

Details Photochemical preparation of silanes containing imide groups Photochemical preparation of silanes containing imide groups

1980-12-15

1982-12-21

Williams, Howard S.

Chemistry: electrical and wave energy

Processes and products

Processes of treating materials by wave energy

B01J 1912

Patent

active

043648088

ABSTRACT:
The compounds according to the invention have the formula I ##STR1## in which R.sup.1, R.sup.2 and R.sup.3 are monovalent organic radicals or chlorine and Z is a tetravalent organic radical and A is a divalent organic grouping. These products are to be used as adhesion promoters, especially between inorganic solids and organic resins. 4 processes of preparation are given.

REFERENCES:
patent: 2901913 (1959-09-01), Lovegrove
patent: 3274155 (1966-09-01), Saunders et al.
patent: 3576031 (1971-04-01), Holub et al.
patent: 3655691 (1972-04-01), Page
patent: 3755354 (1973-08-01), Holub et al.
patent: 3901913 (1975-08-01), Kim
patent: 3956353 (1976-05-01), Plueddemann
patent: 3966531 (1976-06-01), Bargain
patent: 4152346 (1979-05-01), Seiler et al.
patent: 4271074 (1981-06-01), Lohmann et al.
B. W. Lipinski, Defazet, 28, 207 (1974).
F. Hoersch, Kunststoffe, 55, 909 (1965).
R. H. Yocum et al., "Functional Monomers", vol. 2, Dekkar, New York, 1974, p. 234.
N. Boens et al., J. Polymer Sci. (Poly. Chem. Ed.), 13, 201 (1975).

Affiliated with

Also associated with

Rating

Photochemical preparation of silanes containing imide groups does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photochemical preparation of silanes containing imide groups, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photochemical preparation of silanes containing imide groups will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-405131