Photochemical method for the separation of mixtures of xenon and

Details Photochemical method for the separation of mixtures of xenon and Photochemical method for the separation of mixtures of xenon and

1984-05-01

1985-07-09

Williams, Howard S.

Chemistry: electrical and wave energy

Processes and products

Processes of treating materials by wave energy

B01J 1912

Patent

active

045280800

ABSTRACT:
Xenon is isolated from a gaseous mixture containing xenon and krypton. Fline is added to the mixture and the resulting mixture then irradiated with light of about 250-370 nm to form crystals of xenon difluoride. The unreacted gases are removed and the remaining crystals are decomposed, typically by thermal means, to yield xenon and fluorine gas. The xenon gas may be easily isolated by conventional means from the fluorine gas. Krypton may also be easily isolated from the remaining gases by conventional means. The process is particularly applicable to the treatment of offgases from a nuclear reactor or reprocessing plant.

REFERENCES:
patent: 2705219 (1955-03-01), Heiskell et al.
patent: 3185548 (1965-05-01), Fields et al.
patent: 3377136 (1968-04-01), Morrow
patent: 4045316 (1977-08-01), Legan
patent: 4158614 (1979-06-01), Schuster et al.

Affiliated with

Also associated with

Rating

Photochemical method for the separation of mixtures of xenon and does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photochemical method for the separation of mixtures of xenon and, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photochemical method for the separation of mixtures of xenon and will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-908145