Photochemical film-forming method

Details Photochemical film-forming method Photochemical film-forming method

1987-12-14

1989-06-13

Bueker, Richard

Coating processes

Electrical product produced

Welding electrode

427 541, 427 55, 118722, 118620, C23C 1600

Patent

active

048391964

ABSTRACT:
An apparatus for photochemically forming a film on a substrate using a photo-induced chemical vapor deposition method comprises an optical lens through which a light beam is radiated to a reactive atmosphere gas to deposit and grow a film uniform in thickness on a substrate.

REFERENCES:
patent: 4260649 (1981-04-01), Denison
patent: 4340617 (1982-07-01), Deutsch et al.
patent: 4581248 (1986-04-01), Roche
patent: 4694777 (1987-09-01), Roche
Chuang, J. Chem. Phys. 74(2), Jan. 15, 1981 pp. 1453-1460.
"Laser-Induced Chemical Vapor Deposition of SiO.sub.2 ", P. K. Boyer et al., Boyer et al., Appl. Phys. Lett. 40 (8), 15, Aprl. 1985, pp. 716-718.

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