Chemistry: electrical and wave energy – Processes and products – Processes of treating materials by wave energy
Patent
1987-11-10
1989-10-17
Niebling, John F.
Chemistry: electrical and wave energy
Processes and products
Processes of treating materials by wave energy
2041576, 20415769, 2041579, 20415793, 20415794, 20415792, 20415795, 20415774, 20415814, 20415781, 20415773, 20415812, 20415787, B01J 1908, C07C 276, C07C 2900, C07C 3100
Patent
active
048744883
ABSTRACT:
The space-time yield and/or the selectivity of the photochemical dimerization of alkanes, ethers, primary and secondary alcohols, phosphine oxides and primary, secondary and tertiary silanes with Hg and U.V. light is enhanced by refluxing the substrate in the irradiated reaction zone at a temperature at which the dimer product condenses and remains condensed promptly upon its formation. Cross-dimerization of the alkanes, ethers and silanes with primary alcohols is disclosed, as is the functionalization to aldehydes of the alkanes with carbon monoxide.
REFERENCES:
patent: 2636854 (1953-04-01), Cier
patent: 2640023 (1953-05-01), Cier
patent: 2655474 (1953-10-01), Schutze
patent: 2657985 (1953-11-01), Schutze
patent: 2762768 (1956-09-01), Cier
patent: 2830016 (1958-04-01), Cier
patent: 3154586 (1964-10-01), Bander
patent: 4725342 (1988-02-01), Crabtree
Brown Stephen H.
Crabtree Robert H.
Hsing Ben C.
Niebling John F.
Yale University
LandOfFree
Photochemical dimerization and functionalization of alkanes, eth does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photochemical dimerization and functionalization of alkanes, eth, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photochemical dimerization and functionalization of alkanes, eth will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1741869