Photochemical deposition of high purity gold films

Details Photochemical deposition of high purity gold films Photochemical deposition of high purity gold films

1988-09-12

1989-12-19

Morgenstern, Norman

Coating processes

Electrical product produced

Welding electrode

427 541, 4271265, 427253, 427 62, B05D 306, B05D 512, C23C 1600

Patent

active

048882046

ABSTRACT:
High purity gold films are photochemically deposited on substrates from the gold containing compound (CH.sub.3).sub.2 Au[CH(COCF.sub.3).sub.2 ]. A vapor of the gold containing organometallic compound, possibly mixed with a carrier gas, is flowed over the surface of the substrate, which is at 0.degree. C. to 160.degree. C., and preferably at ambient temperature. Photodissociation is induced with ultraviolet light, inasmuch as the organometallic compound is strongly absorbing in the range of from about 300 to 340 nanometers. Substantially no organic fragments are deposited upon the surface, so that the deposited gold film is of high purity.

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Ehrlich et al., "Photodeposition of Metal Films with UV Laser Light", J. Vac. Sci. Technol., 21(1), May/Jun. 1982, pp. 23-32.
Karlicek et al., "Laser-Induced Metal Deposition on InP", J. Appl. Phys., 53(2), Feb. 1982, pp. 1084-1090.

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