Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property or radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-11-27
2007-11-27
Lee, Sin (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property or radiation sensitive...
Radiation sensitive composition or product or process of making
C430S919000, C430S921000, C430S923000, C430S280100, C430S270100, C522S031000, C522S033000, C522S034000, C522S038000, C522S039000, C522S045000, C522S050000, C522S054000, C522S063000, C522S168000, C564S282000, C564S284000, C564S287000, C564S288000, C564S289000, C568S042000, C568S043000, C568S044000, C568S058000
Reexamination Certificate
active
11050740
ABSTRACT:
The photobase generator of the invention is represented by the following formula 1:wherein Ar, R, A+and X−are as defined in the specification. Since the photobase generator of the formula 1 absorbs ultraviolet lights of relatively long wavelength and is photolyzed to generate a strong base efficiently, a composition containing the photobase generator and an episulfide compound is easily cured by polymerization under ultraviolet irradiation.
REFERENCES:
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Cutler, Royal A. et al., “New antibacterial agents. 2- Acylamino 1-(4-hydrocarbonylsulfonylphenyl)-1, 3-propanediols and related compounds” Journal of the American Chemical Society, vol. 74, 5475-81, 1952.
Tachi, Hideki et al., “Photochemical reactions of quaternary ammonium dithiocarbamates as photobase generators and their use in the photoinitiated thermal crosslinking of poly(glycidyl methacrylate)” Journal of Polymer Science, Part A: Polymer Chemistry; vol. 39(9), 1329-1341, 2001.
Shirai, Masamitsu et al., “Photoacid and photobase generators: chemistry and applications to polymeric materials” Progress in Polymer Science, vol. 21(1), 1-45, 1996.
European Search Report mailed Apr. 25, 2005, for EP 05 10 0487.
Hayakawa Junya
Ishii Kenji
Jono Masahiro
Okazaki Hitoshi
Takeuchi Motoharu
Antonelli, Terry Stout & Kraus, LLP.
Lee Sin
Mitsubishi Gas Chemical Company Inc.
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