Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1995-05-24
1996-05-07
Chu, John S. Y.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430191, 430193, 534557, G03F 7023
Patent
active
055145159
ABSTRACT:
A new photoactive compound for use in the formulation of a photoresist comprises a bisphenol compound having an alkyl linkage substituted with a heterocyclic group. The new photoactive compound may be admixed with an alkali soluble resin to formulate a photoresist composition. The new photoactive compounds exhibit enhanced long term solubility in conventional photoresist solvents.
REFERENCES:
patent: 5248582 (1993-09-01), Uenishi et al.
patent: 5424167 (1995-06-01), Uetani et al.
Pandya Ashish
Zampini Anthony
Chu John S. Y.
Goldberg Robert L.
Shipley Company L.L.C.
LandOfFree
Photoactive compounds having a heterocyclic group used in photor does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photoactive compounds having a heterocyclic group used in photor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photoactive compounds having a heterocyclic group used in photor will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1226235