Radiation imagery chemistry: process – composition – or product th – Post imaging processing – With structural limitation
Patent
1988-12-22
1990-05-15
Michl, Paul R.
Radiation imagery chemistry: process, composition, or product th
Post imaging processing
With structural limitation
430 11, 430432, 430496, 430501, 430961, 428192, 428193, G03C 176, G03C 300
Patent
active
049257790
ABSTRACT:
A photo negative strip including a sequence of individual photo frames is protected by laminating two slightly narrower strips of transparent protective film onto the opposed surfaces of the photo strip; each protective strip is removably secured to the photo strip by two edge stripes of a pressure sensitive releasable adhesive. The adhesive stripes covers the sprocket holes near the edges of the photo strip, but edge portions of the photo strip are left, uncovered by either protective film, along both outer edges of the photo strip. The preferred protective film is of biaxially oriented polystyrene.
REFERENCES:
patent: 1943990 (1934-01-01), Pedersen
patent: 2608127 (1952-08-01), Redfield
patent: 2797804 (1957-07-01), Pomeroy et al.
patent: 3041196 (1962-06-01), Stella
patent: 3531193 (1970-09-01), Diehl
patent: 3539344 (1967-05-01), Russell
patent: 3945079 (1976-03-01), Westberg
patent: 4026756 (1977-05-01), Stanfield et al.
patent: 4077830 (1978-03-01), Fulwiler
patent: 4452523 (1984-06-01), Douglas
patent: 4657805 (1987-04-01), Fukumitsu et al.
Policht Stanislaw A.
Vernice Gerard
Chea Thorl
Michl Paul R.
Qualex, Inc.
LandOfFree
Photo strip protection method and product does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photo strip protection method and product, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photo strip protection method and product will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-621275