X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1998-09-01
2000-05-02
Bruce, David V.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 72, 378 87, G01N 2304
Patent
active
060581603
ABSTRACT:
An x-ray diffraction system for determining stress in integrated circuit materials includes a source of x-rays (3) that are directed toward a sample holding mechanism for diffracting from the test sample (8). An x-ray detector (14) is arranged for detecting high back reflected diffracted x-ray intensity data representing stress in the test sample. A two-dimensional detection and storage arrangement (24) is arranged for detecting and storing the data representing stress in the test sample. A data processor (2) accesses the stored data from the two-dimensional detection and storage arrangement and processes the data representing stress in the test sample to determine stress in the test sample.
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Barrett William A.
Bruce David V.
Green, III Edward H.
Hultquist Steven J.
Hypernex, Inc.
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