Radiation imagery chemistry: process – composition – or product th – Stripping process or element – Element
Patent
1993-09-03
1995-06-27
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Stripping process or element
Element
430160, 430167, 430262, 430271, 430286, 430287, 430909, G03C 1805, G03C 191, G03F 7021, G03F 7012
Patent
active
054278902
DESCRIPTION:
BRIEF SUMMARY
DESCRIPTION
1. Technical Field
The present invention relates to a method for forming images by engraving through sand blasting or by etching with chemicals, for instance, solutions of etching agents through an image-carrying mask such as picture images, patterns or letters on the surface of materials to be processed such as glass, stone, pottery, metals, plastics, wooden materials and leather as well as a photo-sensitive laminate film for use in making such an image-carrying mask.
2. Background Art
Conventionally known methods for processing the surface of a material such as glass, a metal or a plastic by engraving images on the surface comprise the steps of first forming a resist layer, in the form of images, on the surface of a material to be processed and then subjecting the entire surface inclusive of the surface of the resist layer to sand blasting to thus engrave the surface on which any image is not present and to thereby form the images thereon. When the material to be processed is glass, a treatment of the surface with hydrofluoric acid can be substituted for the sand blasting treatment and thus desired images can be formed on the surface through engraving and/or etching of the surface portion on which any image is not present. On the other hand, when the material to be processed is a copper plate, the surface can also be treated with an aqueous solution of ferric chloride and thus the desired images can be formed through engraving and/or etching of the surface portion on which any image is not present.
The formation of a resist layer can be performed according to a method which comprises printing desired images on the surface of a material to be processed with a resist ink according to the screen printing method to thus form a resist layer in the form of desired images. Alternatively, a resist layer can also be formed by likewise printing images on the surface of a non-woven fabric of glass fibers according to the screen printing method and then adhering the resulting non-woven fabric carrying the printed images to the surface of a material to be processed.
Moreover, there have been proposed a variety of methods for preparing image-carrying masks using liquid photo-sensitive resins. For instance, Japanese Patent Publication for Opposition Purpose (hereunder referred to as "J. P. KOKOKU") No. Sho 46-35681 discloses a method for producing an image carrying mask which comprises the steps of enclosing a predetermined surface area of a material to be processed such as glass with a rubber frame, directly pouring a photo-sensitive resin into the enclosed area, covering the area with a cellophane film, exposing the resin to light through a negative film carrying pictures and/or patterns, peeling off the cellophane film and then developing the imagewise exposed photo-sensitive resin to thus form a resist layer carrying the desired images.
Japanese Patent Unexamined publication (hereunder referred to as "J. P. KOKAI") No. Sho 53-99258 discloses a method for producing an image-carrying mask which comprises sandwiching a liquid photo-sensitive resin composition between two transparent films to form a photo-sensitive resin composition between two transparent films to form a photo-sensitive layer, exposing the liquid photo-sensitive resin layer to light while bringing the composition in close contact with a photomask carrying desired pictures and/or patterns, peeling off the transparent film on the side of the photomask, removing the unexposed areas of the layer to thus give the desired image, adhering the resulting photo-sensitive resin layer on which the images are thus formed to the surface of a material to be processed so that the face of the former on the photomask side opposes the surface of the material and peeling off the remaining transparent film.
J. P. KOKAI No. Sho 55-96270 discloses a method which comprises the steps of putting a molding frame which also serves as a spacer on a support layer (for instance, a polyester film having a thickness of 100 .mu.m) capable of being treated by sand-blasting
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Suzuki Ikuo
Suzuki Tsutomu
Aicello Chemical Co., Ltd.
Bowers Jr. Charles L.
Chu John S.
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