Photo reticle for fabricating a semiconductor device

Details Photo reticle for fabricating a semiconductor device Photo reticle for fabricating a semiconductor device

1992-07-10

1993-10-05

Wintercorn, Richard A.

Photocopying

Contact printing

Frames

355 53, 430 5, G03B 2728, G03F 900

Patent

active

052509834

ABSTRACT:
An original layout pattern for reticle includes a tip pattern region, a scribe region formed around the tip pattern region, and alignment marks formed in the scribe region. Each end of the alignment marks is not reached to a edge of the original layout pattern. Therefore, when the original layout pattern is formed on the reticle side by side in predetermined times, the alignment marks positioned at an inner portion between two adjacent patterns are separated from each other.

REFERENCES:
patent: 4577958 (1986-03-01), Phillips
patent: 4597664 (1986-07-01), Johannsmeier et al.
patent: 4780615 (1988-10-01), Suzuki
patent: 4823012 (1989-04-01), Kosugi
patent: 4849313 (1989-07-01), Chapman et al.
patent: 4937618 (1990-06-01), Ayata et al.
patent: 4952815 (1990-08-01), Nishi
patent: 4962423 (1990-10-01), Yamada et al.
patent: 4980718 (1990-12-01), Salter et al.
patent: 5160957 (1992-11-01), Ina et al.

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