Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Polymers from only ethylenic monomers or processes of...
Reexamination Certificate
2011-04-26
2011-04-26
Choi, Ling-Siu (Department: 1762)
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
Polymers from only ethylenic monomers or processes of...
C526S316000, C526S346000, C526S347100, C526S317100, C526S318420, C526S236000, C430S281100, C430S287100, C430S139000
Reexamination Certificate
active
07932340
ABSTRACT:
The invention provides a radical generator, although being a self-cleavage type initiator, which is capable of suppressing volatilization of low molecular weight decomposition materials at the time of light radiation and post-baking, and leaving no low molecular weight decomposition materials in the final product, a photosensitive resin composition and an article using the radical generator. The photoradical generator provided according to the invention contains a compound (a) having one or more self-cleavage type radical-generating parts and one or more ethylenic unsaturated groups in one molecule.
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Choi Ling-Siu
Dai Nippon Printing Co. Ltd.
Ladas & Parry LLP
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