Photo-mask used in aligner for exactly transferring main pattern

Details Photo-mask used in aligner for exactly transferring main pattern Photo-mask used in aligner for exactly transferring main pattern

1996-06-24

1998-07-28

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

057861137

ABSTRACT:
A photo-mask has a main pattern implemented by a photo-shield strip and an auxiliary pattern implemented by semi-transparent strips, and the photo-shield strip is equal in width to the semi-transparent strips so as to allow the photo-shield strip to be close to the resolution limit without destroy of the effects of the auxiliary pattern.

REFERENCES:
patent: 5547789 (1996-08-01), Nakatani et al.
patent: 5563009 (1996-10-01), Bae

Affiliated with

Also associated with

Rating

Photo-mask used in aligner for exactly transferring main pattern does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photo-mask used in aligner for exactly transferring main pattern, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photo-mask used in aligner for exactly transferring main pattern will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-21870