Photo-mask having phase and non-phase shifter parts for...

Details Photo-mask having phase and non-phase shifter parts for... Photo-mask having phase and non-phase shifter parts for...

2011-01-11

2011-01-11

Hull, Mark F (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07867671

ABSTRACT:
A photo-mask that includes a first light shielding region which is narrow and elongated, and a second light shielding region which is wider and more elongated than the first light shielding region and is away from the first light shielding region. A phase shifter part and a non-phase shifter part are provided adjacently to both sides of the first light shielding region. Two phase shifter parts or two non-phase shifter parts are respectively provided adjacently to both sides of the second light shielding part.

REFERENCES:
patent: 6582858 (2003-06-01), Lai et al.
patent: 6841318 (2005-01-01), Iwasaki
patent: 2003/0096177 (2003-05-01), Iwasaki
patent: 2004/0219439 (2004-11-01), Asano et al.
patent: 2006/0186409 (2006-08-01), Horino et al.
patent: 2003-149787 (2003-05-01), None

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