Photo-Mask having optical filtering layer on transparent substra

Details Photo-Mask having optical filtering layer on transparent substra Photo-Mask having optical filtering layer on transparent substra

1996-11-19

1998-09-15

Rosasco, S

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

058076484

ABSTRACT:
A photo mask has optical filters on transparent portions of a transparent substrate exposed to openings formed in a photo shield layer, and the optical filters are formed from a photo polymerization material layer in such a manner as to have different thickness depending upon the size of the openings, thereby decreasing the transmittance of the optical filters inversely proportional to the size of the openings.

REFERENCES:
patent: 5536602 (1996-07-01), Nakao

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