Photo-mask blank comprising a shading layer having a variable et

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

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156628, 156644, G03F 900

Patent

active

046968776

ABSTRACT:
In a photo-mask blank comprising a transparent substrate member and a shading layer of chromium covered on a principal surface of the substrate member, the shading layer has a first portion adjacent the principal surface and etched at a first etch rate and a second portion farther from the principal surface than the first portion and etched at a second etch rate lower than the first etch rate. For this purpose, nitrogen is dispersed so that the first portion becomes rich in nitrogen as compared with the second portion. Alternatively, carbon is dispersed so that the first portion becomes scarce in carbon relative to the second portion. The first portion may include nitrogen. The substrate member may comprise a transparent flat plate and a transparent conductive layer coated on the flat plate. The photo-mask blank is processed into a photo-mask through an etching process.

REFERENCES:
patent: 4497878 (1985-02-01), Hatano et al.
patent: 4530891 (1985-07-01), Nagarekawa et al.

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