Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1983-11-15
1986-01-07
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
428664, 428666, 156664, G03F 900
Patent
active
045634076
ABSTRACT:
In a photo-mask blank comprising a transparent substrate member and a shading layer of chromium covered on a principal surface of the substrate member, the shading layer has a first portion adjacent the principal surface and etched at a first etch rate and a second portion farther from the principal surface than the first portion and etched at a second etch rate lower than the first etch rate. For this purpose, nitrogen is dispersed so that the first portion becomes rich in nitrogen as compared with the second portion. Alternatively, carbon is dispersed so that the first portion becomes scarce in carbon relative to the second portion. The first portion may include nitrogen. The substrate member may comprise a transparent flat plate and a transparent conductive layer coated on the flat plate. The photo-mask blank is processed into a photo-mask through an etching process.
REFERENCES:
patent: 4096026 (1978-06-01), Takeuchi
patent: 4139443 (1979-02-01), Sakurai
patent: 4445966 (1984-05-01), Carlson et al.
Maissel et al., Handbook of Thin Film Technology, McGraw-Hill, New York, 1970, pp. 4-29-4-31.
Kagaya Kenichi
Maruyama Kouichi
Matsui Shigekazu
Ushida Masao
Dees Jos,e G.
Hoya Corporation
Kittle John E.
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