Photo mask and method of fabricating array substrate for...

Details Photo mask and method of fabricating array substrate for... Photo mask and method of fabricating array substrate for...

2006-12-15

2010-12-21

Huff, Mark F (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S311000, C430S394000, C349S043000, C349S139000, C349S113000

Reexamination Certificate

active

07855033

ABSTRACT:
A photo-mask used for fabricating a photoresist pattern in process of fabricating an array substrate for a liquid crystal display device comprises a transmissive area having a first transmittance; a blocking area having a second transmittance; a first half-transmissive area including at least one coating layer and having a third transmittance; a second half-transmissive area including a plurality of bars and having a fourth transmittance, the bars having spaces therebetween, wherein the third and fourth transmittances are less than the first transmittance and greater than the second transmittance, respectively, and the third transmittance is greater than the fourth transmittance.

REFERENCES:
patent: 4556608 (1985-12-01), Kaneki et al.
patent: 5786113 (1998-07-01), Hashimoto et al.
patent: 2005/0227395 (2005-10-01), Jeoung et al.
patent: 2002-141512 (2002-05-01), None
patent: 10-2005-0067802 (2005-07-01), None
Office Action issued in corresponding Japanese Patent Application 2006-332789; issued Oct. 30, 2009.

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