Photo mask and method for manufacturing semiconductor device...

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Reexamination Certificate

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C716S030000

Reexamination Certificate

active

07838181

ABSTRACT:
A photo mask includes a dot pattern formed between a line pattern and an island pattern. Methods of making a semiconductor device employing such a photo mask improves yield and productivity of the device.

REFERENCES:
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patent: 7718323 (2010-05-01), Lee
patent: 2005/0026047 (2005-02-01), Yang
patent: 2006/0199084 (2006-09-01), Word
patent: 2006/0269848 (2006-11-01), Setta
patent: 2007/0174802 (2007-07-01), Shin et al.
patent: 2008/0315323 (2008-12-01), Moon
patent: 2009/0233183 (2009-09-01), Moon
patent: 07-248612 (1995-09-01), None
patent: 2005-310965 (2005-11-01), None
Notice of Rejection for Korean Application No. 10-2007-0122952, dated Apr. 29, 2009.

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