Photo mask and method for manufacturing same

Details Photo mask and method for manufacturing same Photo mask and method for manufacturing same

1996-04-16

1998-03-10

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430322, G03F 900

Patent

active

057259739

ABSTRACT:
A photo mask and method for manufacturing the same increase the capacitance of a capacitor by improving the proximity effect of a mask pattern. The photo mask includes a transparent substrate, an opaque mask pattern for defining an optical transmission area on the substrate, and an optical transmittance control film pattern for suppressing proximity effect in the optical transmission area. The proximity effect is suppressed by forming an optical transmittance control film pattern in the transmission area between the individual portions of the opaque mask pattern, so that the mask pattern shape can be exactly transferred onto a substrate.

REFERENCES:
patent: 4902899 (1990-02-01), Lin et al.
patent: 5208124 (1993-05-01), Sporon-Fielder et al.

Affiliated with

Also associated with

Rating

Photo mask and method for manufacturing same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photo mask and method for manufacturing same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photo mask and method for manufacturing same will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-137946