Photo mask and method for fabricating the same

Details Photo mask and method for fabricating the same Photo mask and method for fabricating the same

2007-06-11

2010-11-23

Huff, Mark F (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07838176

ABSTRACT:
A photo mask and the method for fabricating the same wherein the photo mask includes: a mask substrate; a frame pattern formed along a contour of a target pattern to be transcribed to a wafer on the mask substrate, which includes a first pattern arranged in the aperture orientation of an illuminating system and a second pattern arranged perpendicularly to the aperture orientation of the illuminating system; and a third pattern disposed in a inner region of the frame pattern, which has the same transmittance as the second pattern.

REFERENCES:
patent: 5789120 (1998-08-01), Jang et al.
patent: 6841315 (2005-01-01), Imura
patent: 6884551 (2005-04-01), Fritze et al.
patent: 7147975 (2006-12-01), Misaka
patent: 2004/0265708 (2004-12-01), Misaka
patent: 2006/0269851 (2006-11-01), Frisa et al.
patent: 10-2003-0077446 (2003-10-01), None
patent: 10-2006-0076344 (2006-07-01), None

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