Photo mask and method for controlling the same

Details Photo mask and method for controlling the same Photo mask and method for controlling the same

2004-11-23

2009-02-17

Huff, Mark F (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S030000

Reexamination Certificate

active

07491473

ABSTRACT:
In a photo mask to transfer a mask pattern to a substrate by irradiating ultraviolet rays in a mask-pattern-forming region, an evaluation pattern having depressions in which a growable substance of the same kind as that of a foreign substance growing in the mask-pattern-forming region by ultraviolet rays on at least any one surface out of a mask-pattern-forming surface and the back surface thereof. And, the usage limit of the photo mask is evaluated according to a degree of cloudiness of the respective depressions, for instance, by irradiating the evaluation pattern with a high intensity light source.

REFERENCES:
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patent: 5798193 (1998-08-01), Pierrat et al.
patent: 5866283 (1999-02-01), Zandbergen et al.
patent: 5952133 (1999-09-01), Nakasuji
patent: 6492075 (2002-12-01), Templeton et al.
patent: 11-195585 (1999-07-01), None
patent: 2000-267261 (2000-09-01), None

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