Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1994-07-08
1996-04-16
Chapman, Mark
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430320, G03F 900
Patent
active
055081320
ABSTRACT:
A phase-shifted photo mask capable of discrimination between phase shifting portions and a transparent portion (a bare surface portion of a substrate) by microscope observation with visible light. An SOG (spin-on-glass) layer mixed with inorganic colored ions (Co.sup.2+, Mn.sup.3+, Ni.sup.2+ or the like) having an absorption characteristic to the visible light is formed on the surface of the substrate which is substantially transparent to an exposure light (ultraviolet light) and the undesired portions of the SOG layer excluding the portions which are to form the phase shifting portions are removed.
REFERENCES:
patent: 5045417 (1991-09-01), Okamoto
patent: 5114813 (1992-05-01), Smoot et al.
Chapman Mark
Meller Michael N.
Nikon Corporation
LandOfFree
Photo mask does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photo mask, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photo mask will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-324162