Photo-imaging resist ink and cured product thereof

Stock material or miscellaneous articles – Composite – Of epoxy ether

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Details

427510, 430910, 525531, 525533, 525922, 528112, 528115, C08F28300, C08G 5916, B32B 2738

Patent

active

057028206

ABSTRACT:
There is disclosed a photo-imaging resist ink containing (A) an unsaturated group-containing polycarboxylic acid resin which is a reaction product of (c) succinic anhydride with an additive reaction product of (a) an epoxy resin with (b) an unsaturated group-containing monocarboxylic acid, wherein (a) the epoxy resin is represented by the following formula (1): ##STR1## wherein M stands for ##STR2## n is at least 1 on the average; and m is 1 to n on the average. The resist ink is excellent in developability and photosensitivity, while the cured product thereof is excellent in flex resistance and folding resistance, and well satisfactory in adhesion, pencil hardness, solvent resistance, acid resistance, heat resistance, etc.

REFERENCES:
patent: 3980483 (1976-09-01), Nishikubo et al.
patent: 4072592 (1978-02-01), Due et al.
patent: 4097350 (1978-06-01), Pastor et al.
patent: 4918150 (1990-04-01), Sakakibara et al.
patent: 4933259 (1990-06-01), Chihara et al.
patent: 4943516 (1990-07-01), Kamayachi et al.
patent: 4948700 (1990-08-01), Maeda et al.
patent: 5009982 (1991-04-01), Kamayachi et al.
patent: 5049628 (1991-09-01), Nawata et al.
patent: 5100767 (1992-03-01), Yanagawa et al.
patent: 5102702 (1992-04-01), Grundke et al.
patent: 5218061 (1993-06-01), Kajiwara et al.
patent: 5319060 (1994-06-01), Nishikawa et al.
Copy of the European Search Report dated Aug. 5, 1994.
Copy of the European Search Report dated May 2, 1995.

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