Photo-excited processing apparatus for manufacturing a semicondu

Details Photo-excited processing apparatus for manufacturing a semicondu Photo-excited processing apparatus for manufacturing a semicondu

1994-03-11

1994-11-29

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

With treating means

118724, C23C 1600, C23C 1400, B05B 500

Patent

active

053686470

ABSTRACT:
A photo-excited processing apparatus includes a reaction chamber to be filled with raw gas, light excitation means for irradiating a light beam through a light transmissive window formed in the reaction chamber to excite the raw gas, and cylindrical reflection means having a center axis passing through a center of light emission of the light source means and having a reflection plane on an inner surface thereof for directing a portion of the light beam emitted from the light source means to the light transmissive window.

REFERENCES:
patent: 4975561 (1990-12-01), Robinson et al.
patent: 4989544 (1991-02-01), Yoshikawa
patent: 5140469 (1992-08-01), Lamarre et al.
patent: 5179677 (1993-01-01), Anderson et al.

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