Photo-elastic sensor

Details Photo-elastic sensor Photo-elastic sensor

1985-04-25

1987-05-26

LaRoche, Eugene R.

Optics: measuring and testing

Material strain analysis

356 33, 350371, 324 96, 250225, G01B 1116, G02B 530, G02F 101

Patent

active

046680853

ABSTRACT:
Certain materials (e.g. polymers, glasses) exhibit the photo-elastic effect, whereby when they are subject to stress become birefringent, which influences a light beam passing through the glass. This beam, e.g. from a laser is collimated and circularly polarized as it approaches the glass and is again polarized as it leaves the glass. This stress is applied, according to this invention, by magnetostrictive strips on the glass which are influenced, by the magnetic field to be measured or the AC bias field. A miniaturized arrangement using this principle is described.

REFERENCES:
patent: 1921852 (1933-08-01), Whitaker
patent: 3324295 (1967-06-01), Harris
patent: 3432647 (1969-03-01), Wilmotte
patent: 3867014 (1975-02-01), Kemp
patent: 4239329 (1980-12-01), Matsumoto
patent: 4376248 (1983-03-01), Giallorenzi et al.
patent: 4378497 (1983-03-01), Giallorenzi
patent: 4442350 (1984-04-01), Rashleigh
patent: 4516021 (1985-05-01), Taylor

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