Photo deposition of metals with far UV radiation

Details Photo deposition of metals with far UV radiation Photo deposition of metals with far UV radiation

1982-06-30

1984-05-29

Newsome, John H.

Coating processes

Electrical product produced

Welding electrode

427 541, 427252, 2041571R, B05D 306

Patent

active

044515030

ABSTRACT:
A method for depositing a refractory metal onto a substrate wherein a carbonyl compound vapor of the metal in the vicinity of or on the substrate is photodecomposed by ultraviolet radiation of wavelengths less than 200 nm. This causes the release of atoms of the metal, which then condense onto the substrate. In an example, a tungsten layer is photodeposited by this method onto a GaAs semiconductor layer to form a Schottky barrier diode.

REFERENCES:
patent: 3253946 (1966-05-01), Kozikowski et al.
patent: 4324854 (1982-04-01), Beauchamp et al.
patent: 4340617 (1982-07-01), Deutsch et al.

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