Coating apparatus – Gas or vapor deposition
Patent
1992-01-17
1993-06-01
Hearn, Brian E.
Coating apparatus
Gas or vapor deposition
118722, 427582, 427583, 437173, C23C 1600, C23C 1648
Patent
active
052155889
ABSTRACT:
A photo-assisted chemical vapor deposition system includes a reaction chamber, a susceptor in the reaction chamber supporting a wafer, a source for introducing reactant gas into the reaction chamber through an inlet port, and a cover positioned in sealed relationship to the housing and partially bounding the reaction chamber, the cover including a plurality of elongated light pipe openings each having a length comparable to the thickness of a boundary layer of the reactant gas and a diameter-to-length ratio small enough to maintain one-dimensional purge gas flow through the light pipe openings. A plurality of transparent windows are disposed in sealed relationship with the cover and bound an outer end of each of the light pipe openings. Ultraviolet light is introduced through the light pipe openings, which also provide a thick gas layer through which reactant species of the reactant gas must diffuse to reach the window surface. Inert purging gas having a velocity large enough to reduce the concentration of the reactant gas is introduced into the light pipe openings and flows out of the open ends thereof, impeding diffusion of reactant gas molecules toward the windows. Clouding of the windows is thereby effectively avoided.
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Amtech Systems, Inc.
Everhart Byron S.
Hearn Brian E.
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