Photo CVD apparatus, with deposition prevention in light source

Details Photo CVD apparatus, with deposition prevention in light source Photo CVD apparatus, with deposition prevention in light source

1987-09-03

1989-03-14

Beck, Shrive

Coating apparatus

With vacuum or fluid pressure chamber

With means to apply electrical and/or radiant energy to work...

118723, 427 541, 427 531, C23C 1400, C23C 1600

Patent

active

048116840

ABSTRACT:
A photo CVD apparatus for use with a reactive gas is disclosed, which includes a reaction chamber, a second chamber for a light source, separated from the reaction chamber by a transparent window. There is also a conduit connecting these two chambers and a means for preventing deposition by the reactive gas on the light source chamber walls, such as heating, is provided. Examples of this technique's applicabilities are given with such gases as Si.sub.2 H.sub.6 or Al(CH.sub.3).sub.3 and ammonia.

REFERENCES:
patent: 4588610 (1986-05-01), Yamazaki
patent: 4623426 (1986-11-01), Peters

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