Photo CVD apparatus with a glow discharge system

Details Photo CVD apparatus with a glow discharge system Photo CVD apparatus with a glow discharge system

1989-05-12

1993-02-02

Lawrence, Evan

Coating apparatus

Gas or vapor deposition

With treating means

118715, 118722, C23C 1648

Patent

active

051835118

ABSTRACT:
A photo CVD apparatus includes a reaction chamber, a light source for radiating light to the inside of the chamber through a light window, and a pair of electrodes disposed in the chamber for glow discharge, one of the electrodes being located on the light window. After deposition by photo CVD, a light window for transmission of UV light is cleaned by plasma etching by virtue of glow discharge taking place between the electrodes. The light source and the electrodes for plasma etching share one power supply for supplying high frequency electric power.

REFERENCES:
patent: 4664938 (1987-05-01), Walker
patent: 4857139 (1989-08-01), Tashiro et al.
patent: 4910044 (1990-03-01), Yamazaki et al.

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