Photo CVD apparatus having no ultraviolet light window

Details Photo CVD apparatus having no ultraviolet light window Photo CVD apparatus having no ultraviolet light window

1987-05-26

1989-08-15

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118715, 118 501, 118620, C23C 1600

Patent

active

048564583

ABSTRACT:
An improved Photo CVD apparatus having no window for ultraviolet light is shown. In the reaction chamber of the apparatus, an ultraviolet light source is placed directly in the chamber filled with the process gas so that no loss of light is there and high deposition speed is obtained. This structure is realized by providing extra rooms in the reaction chamber to protect the terminals of the electrodes.

REFERENCES:
patent: 3372672 (1968-03-01), Wright
patent: 4474829 (1984-10-01), Peters

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