Coating apparatus – Gas or vapor deposition – With treating means
Patent
1988-09-16
1989-06-06
Bueker, Richard
Coating apparatus
Gas or vapor deposition
With treating means
118715, 118719, 118 501, 118620, C23C 1600
Patent
active
048361402
ABSTRACT:
A photo-CVD (chemical vapor deposition) apparatus is disclosed, in which at least two light transmission plates are used and the light from a light source is introduced into a gas reaction chamber through one of light transmission plates inserted into the chamber to cause the reactions in a reaction gas to thereby deposit a thin film or layer on a substrate located in the gas reaction chamber. In this case, a light transmission plate polluted by the reaction gas is moved to the outside of the chamber, then washed or exchanged with a new one manually or automaticaly while a clean one is inserted into the chamber, so that the photo-CVD process can be carried out continuously without interrupting the irradiation of the light from the light source.
REFERENCES:
patent: 4500565 (1985-02-01), Hiramoto
patent: 4503807 (1985-03-01), Nakayama
patent: 4525382 (1985-06-01), Sugioka
patent: 4534314 (1985-08-01), Ackley
patent: 4595601 (1986-06-01), Horioka
Bueker Richard
Hoshin Kagaku Sangyosho Co., Ltd.
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