Photo-curable resin composition and process for preparing resin-

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Compositions to be polymerized by wave energy wherein said...

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526 72, 526 75, 526 88, 526 89, 5263181, 5263184, 522 35, 522 43, 522 64, 522 68, 522 82, 522 83, 264239, 264257, 26433111, 26433115, C08F 246, B27N 308

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059326255

ABSTRACT:
A photo-curable resin composition suitable as a material for photo-fabricating and capable of producing cured products with excellent mechanical strength and high heat resistance. Further disclosed is a process for molding a resin-based mold which provides superior molding dimensional precision and superb repetition durability. The resin composition contains a monomer component containing (A) 30-70 wt % of a polyfunctional unsaturated monomer having a cyclic structure and (B) 70-30 wt % of a monofunctional unsaturated monomer having a cyclic structure of which the homopolymer has a glass transition temperature (Tg) of 70.degree. C. or higher; (C) a photo-initiator; and (D) an inorganic filler having an average particle diameter or an average fiber length of 1-50 .mu.m, wherein the ratio of the inorganic filler to 100 parts by volume of the monomer components and the photo-initiator is 100-160 parts by volume, and the heat distortion temperature of the cured resin produced from the photo-curable resin composition is 100.degree. C. or higher.

REFERENCES:
patent: 4575330 (1986-03-01), Hull
patent: 4942066 (1990-07-01), Fan
patent: 5002855 (1991-03-01), Fan
patent: 5496870 (1996-03-01), Chawla et al.
Derwent Abstract 008048476, JP 1232025, Sep. 1989.
Derwent Abstract 010200745, JP 7026062, Jan. 1995.
Derwent Abstract 010200743, JP 7026060, Jan. 1995.

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