Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1997-10-17
2000-10-03
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
4302801, 430171, 522170, 522169, 522 15, 522 25, G03F 716, G03F 7029, G03F 7004
Patent
active
061270857
ABSTRACT:
A novel photo-curable resin composition. The resin composition capable of providing a cured product having excellent mechanical strength, high dimensional accuracy, and excellent toughness. The resin composition is capable of providing a cured product which experiences little change in mechanical strength over time. The resin composition is capable of forming, by photo-fabricating, a three-dimensional object which can be used for a long period of time in a humid atmosphere. The composition comprises, (A) an epoxy compound having a cyclohexene oxide, (B) a cationic photo-initiator, (C) an ethylenically unsaturated monomer, (D) a radical photo-initiator, and (E) a polyol.
REFERENCES:
patent: 4139655 (1979-02-01), Tsao
patent: 4575330 (1986-03-01), Hull
patent: 4818776 (1989-04-01), Koleske
patent: 5155143 (1992-10-01), Koleske
patent: 5434196 (1995-07-01), Ohkawa et al.
patent: 5476748 (1995-12-01), Steinmann et al.
patent: 5495029 (1996-02-01), Steinmann et al.
patent: 5707780 (1998-01-01), Lawton et al.
patent: 5739214 (1998-04-01), Schunck
13:17 344, Chemical Abstract of Japan 2-75618 issued Mar. 15, 1990, American Chemical Society.
90-127832, WPIDS, English Abstract of Japan 2-75618, issued Mar. 15, 1990, Derwent Information Ltd.
RN 87211-27-6, Registry, American Chemical Society 1998.
RN 25085-98-7, Registry, American Chemical Society, 1998.
RN 15625-89-5, Registry, American Chemical Society, 1998.
Patent Abstracts of Japan, vol. 14, No. 261 (C-0725), Jun. 6, 1990 (abstract of JP-02-075618).
Takeuchi Akira
Ukachi Takashi
Watanabe Tsuyoshi
Yamamura Tetsuya
DSM N.V.
Hamilton Cynthia
Japan Fine Coatings Co., LTD
JSR Corporation
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